PETRA Nanoimprint Stepper
【Machine Name】
Nanoimprint Stepper
【Overview】
A system built by RISE ONE under the supervision of AIST (Tsukuba). It transfers the pattern of a finely engraved mold in a single step. A key feature of this system is its ability to keep the residual layer thin after transfer.
【Specifications & Features】
- Mechanisms & Functions -
■ Nanoimprint unit [mold table] with α/β mold adjustment mechanism
■ High-precision XYθ wafer stage
■ Wafer bending mechanism and XY stage
■ Alignment microscopes ×2
■ Constant temperature and humidity chamber
■ Ionizer
■ Mass flow controllers ×4 (TFP, CTFP, nitrogen, helium)
■ UV light source
■ Digital camera
- Specifications -
■ Mold size: □22 mm, □50 mm, □75 mm (effective area approx. 70–72 mm square) (quartz, 6.35 mm thick, trapezoidal)
■ Wafer size: 8-inch Si wafers (725 µm thick), 200 mm square glass substrates (0.55–1.2 mm thick)
■ Pressing force: 10–250 N (22 mm square: 49 N at 0.1 MPa; 50 mm square: 250 N at 0.1 MPa; 75 mm square: 0.05 MPa)
■ Collimated LED UV light source (365 nm, φ4-inch area, 10 mJ/cm² or more)
■ Alignment accuracy: Pre-alignment 1 µm or less (pattern/edge detection)
■ Fine alignment: 100 nm or less (moiré detection)
■ Precision XY stage for alignment: 120 × 120 mm travel, resolution 10 nm or less
■ Precision θ stage for alignment: Resolution 0.25 arcseconds or less (0.00007° or less)
